| 引用本文: | 李玉阁,刘伟阳,雷明凯.高功率脉冲磁控溅射轮辐特征等离子体研究综述*[J].中国表面工程,2022,35(1):1~9 |
| LI Yuge,LIU Weiyang,LEI Mingkai.Research Review of the Plasma with Spoke Characteristic for High Power Impulse Magnetron Sputtering[J].China Surface Engineering,2022,35(1):1~9 |
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| 摘要: |
| 高功率脉冲磁控溅射技术(HiPIMS)是最新一代磁控溅射技术，高度离化的脉冲等离子体是 HiPIMS 技术的核心特征。 针对 HiPIMS 放电轮辐特征，评述特征放电下 HiPIMS 等离子体测量、模拟及对薄膜生长作用的最新研究进展。较之常规磁控溅射技术，HiPIMS 溅射靶材粒子高度离化，等离子体阻抗显著降低。等离子体在靶材表面形成以千米每秒速度旋转漂移的致密等离子体结构，存在局域化和自组织特征，可显著影响沉积粒子输运行为，为沉积薄膜生长提供一个新的控制维度。 HiPIMS 放电轮辐一般呈现扩散形和三角形两种形态，通过介绍轮辐变化规律、形成机制的进展，明确靶材溅射产额也对其形态有影响。另一方面，HiPIMS 轮辐结构结合其脉冲放电特点，可控制薄膜沉积通量输运特征，进而影响沉积薄膜的微结构、表面粗糙度等表面完整性参数。具有微秒到毫秒跨尺度多级脉冲调节能力的高功率调制脉冲磁控溅射(MPPMS)和高功率深振荡脉冲磁控溅射(DOMS)，脉冲控制跨时间尺度特性带来的轮辐特征可剪裁性，为在更大时间和空间维度上薄膜生长控制提供了可能性。 |
| 关键词: 高功率脉冲磁控溅射 放电电流 轮辐 等离子体阻抗 粒子输运 |
| DOI：10.11933/j.issn.1007-9289.20210424001 |
| 分类号:TG156;TB114 |
| 基金项目:国家重点基础研究发展计划(2018YFA0704603)；国家自然科学基金(51601029, U1508218)；中央高校基本科研业务费专项资金(DUT19JC52)资助项目 |
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| Research Review of the Plasma with Spoke Characteristic for High Power Impulse Magnetron Sputtering |
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LI Yuge, LIU Weiyang, LEI Mingkai
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School of Materials Science and Engineering, Dalian University of Technology, Dalian 116024 , China
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| Abstract: |
| High Power Impulse magnetron sputtering (HiPIMS) is the latest generation of magnetron sputtering technology, and highly ionized pulsed plasma is the core feature of HiPIMS technology. This paper reviews the latest advances in plasma simulation, measurement of HiPIMS and its effect on film growth based on its spoke discharge characteristic. Compared with the conventional magnetron sputtering technology, the target particles are highly ionized and the plasma resistance is significantly reduced in HiPIMS. The plasma can form dense plasma structures that rotate at a speed of kilometer pen second on the surface of the target. With the characteristics of localization and self-organization, they can significantly affect the transport behavior of deposited particles and provide a new control dimension for film deposition. Spokes generally present diffuse shape and triangle shape in HiPIMS. Through the detailed introduction of the change law of spokes and the progress of the formation mechanism, it is clear that the sputtering yield of the target materials also affects spokes' morphology. On the other hand, combined with the pulse modulation, spokes can control the transport characteristics of the film deposition flux, thereby affecting the microstructure of the deposited film, surface roughness and other surface integrity parameters. Modulated Pulsed Power magnetron sputtering (MPPMS) and Deep Oscillation magnetron sputtering (DOMS) with the microsecond to millisecond cross-scale multi-level pulse adjustment capability, could be used to control the film growth in a larger spatial dimension due to the tailored spoke characteristics brought about by the cross-time scale characteristic of pulse control. |
| Key words: high power impulse magnetron sputtering discharge current spoke plasma resistance particle transport |
