| 引用本文: | 左帅,王浩琦,陈淑年,庞盼,廖斌.NiCr和TiAl合金靶材阴极电弧弧斑的运动特性[J].中国表面工程,2019,32(3):59~68 |
| ZUO Shuai,WANG Haoqi,CHEN Shunian,PANG Pan,LIAO Bin.Motion Characteristics of Cathodic Arc Spots of NiCr and TiAl Alloy Targets[J].China Surface Engineering,2019,32(3):59~68 |
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| 摘要: |
| 研究采用多弧离子镀技术镀膜时，电弧放电阶段中电弧弧斑的运动对后续膜层质量与靶材烧蚀有着非常重要的影响，目前很少有弧斑运动相关的研究。研究通过外加脉冲磁场以实现对阴极靶面磁场分布的精确调控，探究了磁场分布对弧斑运动的影响，并结合分形理论分析弧斑的运动轨迹，系统研究了电弧放电过程中靶面电弧弧斑的运动特性。结果表明，在永磁铁磁场与脉冲磁场共同作用下，弧斑在原有的随机运动基础上叠加了反安培力方向的旋转运动与向靶沿扩散的漂移运动。随着靶面总磁场强度的上升，弧斑平均运动速度增加，弧斑寿命变短；弧斑运动范围可控，最大运动范围可覆盖靶面的90％以上；分形维数可控，镍铬合金靶和钛铝合金靶弧斑轨迹图像的最大分形维数可分别为1.145和1.159，对应靶材烧蚀区域面积达到92％。通过改进工艺参数，能够显著减少大颗粒污染并提升膜层质量，同时通过维数可预测靶材烧蚀情况，能更高效地利用靶材。 |
| 关键词: 多弧离子镀 弧斑运动 靶材烧蚀 脉冲磁场 分形 |
| DOI：10.11933/j.issn.1007-9289.20190228001 |
| 分类号:TG174.444 |
| 基金项目: |
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| Motion Characteristics of Cathodic Arc Spots of NiCr and TiAl Alloy Targets |
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ZUO Shuai1, WANG Haoqi1, CHEN Shunian1, PANG Pan2, LIAO Bin1,2
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1.College of Nuclear Science and Technology, Beijing Normal University, Beijing 100875, China;2.Beijing Radiation Center, Beijing 100875, China
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| Abstract: |
| The motion of arc spot in arc discharge stage has very important influence on the quality of subsequent film layer and target ablation when using multi-arc ion plating technology. However, There are few investigations on arc spot motion so far. The influence of magnetic field distribution on arc spot motion was studied by applying pulse magnetic field to realize the accurate regulation of magnetic field distribution on the cathode target surface, and the trajectory of arc spot motion was analyzed based on fractal theory. The motion characteristics of arc spot on the target surface during arc discharge were systematically studied. Results show that under the synergetic effect of permanent magnet and pulsed magnetic field, the arc spot superimpos the rotation motion of the anti-ampere force direction and the drift motion towards the target along the diffusion direction on the basis of the original random motion. With the increase of the total magnetic field intensity of the target surface. The average velocity of the arc spot increases and the lifetime of the arc spot becomes shorter. The motion range of the arc spot can be controlled, and the maximum motion range can cover more than 90% of the target surface. The maximum fractal dimension of arc images of Ni-Cr alloy target and Ti-Al alloy target is 1.145 and 1.159, respectively, and the ablation area of the target reaches 92%. By improving the process parameters, large particles can be significantly reduced and the film quality is improved. At the same time, the ablation of target can be predicted by fractal dimension, and the target can be used more efficiently. |
| Key words: multi-arc ion plating arc spots motion target ablation pulsed magnetic field fractal |
