| 引用本文: | 徐星,苏峰华,李助军.脉冲偏压对直流磁控溅射沉积MoN薄膜结构及性能的影响[J].中国表面工程,2019,32(2):54~62 |
| XU Xing,SU Fenghua,LI Zhujun.Effects of Pulse Bias on Structure and Properties of MoN Film Deposited by DC Magnetron Sputtering[J].China Surface Engineering,2019,32(2):54~62 |
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| 摘要: |
| MoN薄膜是一种具有潜在应用价值的薄膜材料，但对于其结构和性能的研究还较少。采用直流磁控溅射技术在304不锈钢基体表面沉积MoN薄膜，研究了脉冲偏压对MoN薄膜结构和性能的影响，并系统研究了MoN薄膜在不同摩擦条件下的摩擦磨损行为。采用X射线衍射仪和扫描电镜分析薄膜的晶相结构、晶粒尺寸、表面及断面形貌，采用HMV-2T显微硬度仪测试薄膜的显微硬度。采用UMT-TriboLab多功能摩擦磨损试验机评价薄膜的摩擦磨损性能，并用扫描电镜观察磨损表面，分析其磨损机制。结果表明：脉冲偏压显著影响直流磁控沉积的MoN薄膜的晶相结构、表面形貌、断面结构、硬度和摩擦磨损性能；随脉冲偏压的增大，MoN薄膜的膜厚、硬度都先增大后减小，而薄膜的磨损率却先减小后增大，其中-500 V脉冲偏压下沉积的MoN薄膜具有最高硬度为7731 N/mm2，以及最低的磨损率为5.8×10-7 mm3/（N·m）。此外，MoN薄膜在不同载荷和转速的摩擦条件下表现出不同的摩擦学行为。 |
| 关键词: 脉冲偏压 直流磁控溅射 MoN薄膜 摩擦学性能 |
| DOI：10.11933/j.issn.1007-9289.20181106003 |
| 分类号:TG174.444 |
| 基金项目:国家自然科学基金（51775191）；中央高校科研业务费（2018ZD29）；广东省科技计划项目（2016A010102009） |
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| Effects of Pulse Bias on Structure and Properties of MoN Film Deposited by DC Magnetron Sputtering |
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XU Xing1, SU Fenghua1, LI Zhujun2
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1.School of Mechanical and Automotive Engineering, South China University of Technology, Guangzhou 510641, China;2.School of Mechanical and Electrical Engineering, Guangzhou Railway Polytechnic, Guangzhou 510430, China
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| Abstract: |
| There are less studies on the structure and properties of MoN film, which is a kind of material with potential application value. MoN films were deposited on the surface of 304 stainless steel by DC magnetron sputtering technique with different pulse biases. Effects of pulse bias on the structure and properties of the as-prepared MoN films were investigated. The friction and wear behaviors of the MoN films under different sliding conditions were also systematically studied. The surface and cross-sectional morphologies, the crystalline phase and the grain size of the as-prepared MoN films were analyzed by XRD and SEM. The hardness of the film was evaluated with a HMV-2T hardness tester. The tribological properties of the film were studied using a UMT-TriboLab multifunctional friction and wear tester, and the wear mechanisms were analyzed by analyzing the wear surface using SEM. The results show that the pulse bias significantly affects the crystalline phase, surface and cross-section morphologies, hardness and tribological properties of the MoN films deposited by DC magnetron sputtering technique. The thickness and hardness of the MoN film increases initially and then decrease with increase of the pulse bias, while the wear rate exhibits opposite variation trend. i.e., first decreases and then increases. The MoN film deposited at -500 V pulse bias presents the highest hardness of 7731 N·mm-2 and the lowest wear rate of 5.8×10-7 mm3/(N·m). Additionally, the MoN film exhibits different tribological behaviors with the changes of the applied loads and sliding speeds. |
| Key words: pulse bias DC magnetron sputtering MoN film tribological property |
