| 引用本文: | 耿东森,吴正涛,聂志伟,黎海旭,张小波,代伟,王启民.基体偏压对电弧离子镀AlCrSiON涂层结构和热稳定性的影响[J].中国表面工程,2016,29(6):60~66 |
| GENG Dong-sen,WU Zheng-tao,NIE Zhi-wei,LI Hai-xu,ZHANG Xiao-bo,DAI Wei,WANG Qi-min.Influence of Substrate Bias on Microstructure and Thermal Stability of AlCrSiON Coatings Deposited by Arc Ion Plating[J].China Surface Engineering,2016,29(6):60~66 |
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| 摘要: |
| 为研究基体偏压对AlCrSiON纳米复合涂层结构、力学性能和热稳定性的影响规律及机制，采用电弧离子镀技术在硬质合金基体上沉积AlCrSiON涂层。利用扫描电子显微镜（SEM）、X射线衍射仪（XRD）、透射电子显微镜（TEM）、纳米压痕仪（划痕仪）研究涂层组织结构和力学性能；通过真空退火试验研究涂层的高温稳定性。结果表明：AlCrSiON涂层为致密柱状晶结构，并主要由c-（Al，Cr）N和c-（Al，Cr）（O，N）两相组成，呈现出纳米复合结构。随着偏压的升高，涂层表面的颗粒数目和尺寸减少，组织结构更加致密；硬度和弹性模量均呈现出先增加后减小的趋势，当偏压为-80 V时分别达到最大值30.1 GPa和367.9 GPa。涂层具有良好的高温稳定性，不同偏压下沉积的AlCrSiON涂层经800~950℃热处理后均能够保持良好的结构稳定性及力学性能，但经1 100℃热处理后涂层发生相分解并引发组织结构变化，导致涂层硬度减小。 |
| 关键词: 基体偏压 AlCrSiON 真空退火 组织结构 热稳定性 |
| DOI：10.11933/j.issn.1007-9289.2016.06.009 |
| 分类号: |
| 基金项目:国家自然科学基金（51275095，U1201245，51522502）；广东省自然科学基金（2014A030311002，2016A050502056） |
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| Influence of Substrate Bias on Microstructure and Thermal Stability of AlCrSiON Coatings Deposited by Arc Ion Plating |
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GENG Dong-sen, WU Zheng-tao, NIE Zhi-wei, LI Hai-xu, ZHANG Xiao-bo, DAI Wei, WANG Qi-min
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School of Electromechanical Engineering, Guangdong University of Technology, Guangzhou 510006
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| Abstract: |
| To investigate the effects of varying substrate bias on the microstructure, mechanical properties and thermal stability of the AlCrSiON nanocomposite coatings, the coatings were deposited on cemented carbide using arc ion plating. The microstructure, mechanical properties and thermal stability were analyzed by SEM, XRD, TEM, nano-indentation, scratch test and vacuum annealing tests, respectively. The results indicate that the coatings exhibit a dense columnar structure and are mainly composed of c-(Al, Cr) and c-(Al, Cr)(O, N) phases. With the increase of substrate bias, both the number and average sizes of the particles on the coating surface decrease. The coatings become denser at higher bias voltage. The hardness and elastic modulus of the AlCrSiON coatings reveal the tendency of first increasing and then decreasing with increase of the substrate bias. The highest values of 30.1 GPa and 367.9 GPa are observed for the coatings deposited at -80 V. The coatings exhibit good thermal stability. After vacuum annealing at 800-950℃, the microstructure and mechanical properties of the AlCrSiON coatings change slightly. However, after vacuum annealing at 1 100℃, the phase occurs decomposition, resulting in the hardness decrease. |
| Key words: substrate bias AlCrSiON vacuum annealing structure thermal stability |
