引用本文: | 宋建强, 郑晓华, 杨芳儿, 陈乐生, 郑晋翔, 沈涛.靶基距对脉冲激光沉积CNx薄膜微结构和摩擦学性能的影响[J].中国表面工程,2013,26(1):63~68 |
| SONG Jian-qiang, ZHENG Xiao-hua, YANG Fang-er, CHEN Le-sheng, ZHENG Jin-xiang, SHEN Tao.Effects of Target to Substrate Distance on Microstructure and Tribological Properties of Pulsed Laser Deposited CNx Films[J].China Surface Engineering,2013,26(1):63~68 |
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摘要: |
用脉冲激光沉积法制备CNx靶材在氮气中进行烧蚀,在不同靶基距下制备了CNx薄膜。用扫描电子显微镜(SEM)、X射线光电子谱(XPS)和 Raman光谱等对薄膜的表面形貌、化学成分以及元素化学状态进行了表征。用球盘式微型摩擦磨损试验仪测试了薄膜在大气中的摩擦学特性。结果表明:随着靶基距增大到45 mm时,CNx薄膜中的含氮量(原子数分数)上升至23.9%,有利于sp3C-C键和N-sp3C键的形成。当靶基距从45 mm增大至51 mm时,薄膜的含氮量下降至15.5%,薄膜中sp3C-N键和N-sp3C键的相对原子数分数亦随之减少,薄膜中的sp2C-C键的相对原子数分数从45.2%增加至55.9%,磨损率从4.3×1015 m3 /Nm上升至3.1×1014 m3 /Nm。CNx薄膜的平均摩擦因数随着靶基距的增大从0.25下降到0.18。 |
关键词: 薄膜 氮化碳 脉冲激光沉积 X射线光电子谱 摩擦磨损 |
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基金项目:浙江省自然科学基金(Y4110645) |
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Effects of Target to Substrate Distance on Microstructure and Tribological Properties of Pulsed Laser Deposited CNx Films |
SONG Jian-qiang, ZHENG Xiao-hua, YANG Fang-er, CHEN Le-sheng, ZHENG Jin-xiang, SHEN Tao1,2
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1. College of Mechanical Engineering, Zhejiang University of Technology, Hangzhou 310014;2. Wenzhou Hongfeng Electrical Alloy Co., Ltd., Wenzhou 325603, Zhejiang
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Abstract: |
Typical CNx films were prepared by pulsed laser ablation of CNx target at various targettosubstrate distances (TSD). The surface morphology, chemical composition and chemical bonding structure of the films were characterized by scanning electron microscopy (SEM), X-ray photoelectron spectroscopy (XPS) and Raman spectroscopy respectively. The tribological behavior of the films was investigated by using a ballondisk tribometer in atmosphere. The results show that when the TSD increases to 45 mm, the nitrogen concentration of the film is up to 23.9%, and the area fraction of sp3C-C and N-sp3C bonds increase. However, with the TSD up to 51 mm, the nitrogen concentration is down to 15.5%, the area fraction of sp3C-N and N-sp3C bonds decrease, the area fraction of sp2C-C bond increase up to 55.9%, and the wear rate of CNx film increase from 4.3×1015 to 3.1×1014 m3 /Nm. The average friction coefficient of CNx film decreases from 0.25 to 0.18。 |
Key words: thin films carbon nitride pulsed laser deposition X-ray photoelectron spectroscopy friction and wear |