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| 摘要: |
| 采用真空加热和辉光离子轰击加热两种方式,对化学镀镍Si3N4陶瓷进行扩散热处理,并利用X射线衍射仪分析和讨论了化学镀Ni层与Si3N4的界面反应.分析表明,辉光离子轰击扩散能够显著促进镀Ni层与Si3N4的界面反应,其界面反应产物为Ni2Si、Ni3Si和Ni5Si2.随着扩散热处理温度的提高,反应产物的数量明显增加.处理前后,化学镀镍Si3N4陶瓷与金属钎焊接头剪切强度可由70mPa提高至123mPa. |
| 关键词: 化学镀镍 陶瓷 界面反应 |
| DOI： |
| 分类号:TG454 |
| 基金项目:国家自然科学基金资助项目(59175211) |
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| The Interface Reaction of Chemical Ni-plating Layer and Si3N4 Ceramic Substrate |
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ZHANG Yong-qing1 3 REN Jia-lie2 ZHAO Peng-sheng3
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| Abstract: |
| In this paper, two different methods of vacuum heating and glow discharge ion bombardment heating were used to promote the reaction at the interface of chemical Ni-plating layer and Si3N4 substrate, it was analysed by X-ray diffraction and discussed. The results indicated that the interface reactions were remarkably promoted by glow discharge diffusion, the interface reaction products were Ni2Si,Ni3Si and Ni5Si2. If a chemical Ni-plating layer / Si3N4 sample was tempered by a high-temperature diffusion treatment of glow discharge, the interface reaction products increased. The joint shear strength of Ni plated Si3N4 ceramics increased from70 MPa to 123 MPa after the glow discharge diffusion treatment. |
| Key words: chemically Ni-plated,ceramic,interface reaction |
