引用本文:朱四美, 张贵锋, 侯晓多, 瞧朝晖.反应磁控溅射法直接制备光催化纳米TiO2薄膜[J].中国表面工程,2012,25(4):56~61
.Photocatalytic TiO2 Thin Films Directly Prepared by Reactive Magnetron Sputtering[J].China Surface Engineering,2012,25(4):56~61
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反应磁控溅射法直接制备光催化纳米TiO2薄膜
朱四美1, 张贵锋1, 侯晓多1, 瞧朝晖2
(1. 大连理工大学 材料科学与工程学院 三束材料改性教育部重点实验室, 辽宁 大连 116024; 2. 上海宝钢集团 钢铁研究院, 上海 200050)
摘要:
通过优化直流反应磁控溅射沉积工艺,在氩气和氧气气氛中溅射高纯钛靶,在玻璃和不锈钢衬底上直接低温沉积出具有锐钛矿结构的TiO2薄膜。通过X射线衍射仪(XRD)、原子力显微镜(AFM)和表面轮廓仪分析发现,当氧的体积分数在5%~20%之间变化时,制得的TiO2薄膜是致密的锐钛矿结构,具有典型的锐钛矿相(101)、(004)、(112)、(211)、(220)的晶面特征峰,薄膜的晶粒尺寸随着氧含量的增加逐渐减小,其生长速率最快可达到68 nm/min。在紫外光的照射下分解甲基橙实验表明,所制备的薄膜具有良好的光催化分解有机物的能力。
关键词:  TiO2薄膜  反应磁控溅射  锐钛矿  氧浓度  光催化效应
DOI:
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Photocatalytic TiO2 Thin Films Directly Prepared by Reactive Magnetron Sputtering
ZHU Simei1, ZHANG Guifeng1, HOU Xiaoduo1, QIAO Zhaohui2
(1. Key Laboratory of Materials Modification by Laser, Ion and Electron Beams, Ministry of Education, School of Materials Science and Engineering, Dalian University of Technology, Dalian 116024, Liaoning; 2. Research Institute of Iron & Steel, Shanghai Bao Steel Group, Shanghai 200050)
Abstract:
TiO2 films with anatase crystal structure were directly prepared by DC reactive magnetron sputtering in an Ar/O2 gas mixture using optimizing technologic parameters. TiO2 thin films with anatase crystal structure exhibit characteristic diffraction peaks of (101)、(004)、(112)、(211) and (220) through Xray diffraction (XRD), atomic force microscope (AFM) and surface profilometer. The grain size of the films gradually decreases with increasing oxygen content and the maximum growth rate can be up to 68 nm/min when the concentration of oxygen was between 5% and 20%. Under UV illumination, the experiments of the decomposition of methyl orange (MO) solution show that the TiO2 films have a good property of photocatalytic decomposition of organic matters.
Key words:  TiO2 films  reactive magnetron sputtering  anatase  ogygen concentration  photocatalytic activity
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