负偏压对低温沉积TiN薄膜表面性能的影响

白秀琴<sup>1; 2</sup>; 李  健<sup>1</sup>

引用本文:	白秀琴,李健.负偏压对低温沉积TiN薄膜表面性能的影响[J].中国表面工程,2005,(5):20~23,27
	.Effect of Negative Bias Voltage on the Surface Properties of Low Temperature Deposition TiN Films[J].China Surface Engineering,2005,(5):20~23,27

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负偏压对低温沉积TiN薄膜表面性能的影响
白秀琴^1,2，李健¹

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摘要:

研究了在低温磁控溅射沉积TiN薄膜过程中,负偏压对基体温度、薄膜表面性能、薄膜与基体界面结合强度以及摩擦学性能的影响.研究结果表明,加负偏压条件下,明显提高基体温度,有益于晶粒细化,提高硬度,改善色泽,提高TiN/基体的界面结合强度,但会引起表面轻微的粗糙化;摩擦学试验表明,负偏压对低温磁控溅射TiN薄膜及其摩擦副的摩擦磨损性能的影响较明显.

关键词: 低温磁控溅射负偏压 TiN薄膜

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Effect of Negative Bias Voltage on the Surface Properties of Low Temperature Deposition TiN Films

BAI Xiu-qin ^1,2, LI Jian ¹

Abstract:

A series of experiments were conducted to study the effects of negative bias voltage on substrate temperature, surface properties of the film, adhesive strength with the substrate, and tribological properties of the film during the preparation of TiN film using low-temperature magnetic sputtering technology. Experimental results showed that the negative bias voltage exhibits an important influence on the properties of TiN film. The addition of negative bias voltage resulted in a significant increase of substrate temperature, decrease of grain size , increase of hardness, improvement of luster, and increase of adhesive strength. In addition, the negative bias voltage resulted also in a negative influence, that is, the rougher film surface. Accordingly, it showed a great effect on the wear properties of the TiN film.

Key words: low temperature magnetic sputtering negative bias voltage TiN film